Spin Coater Model KW-4A, Two Stage Spinning, 220 /50 Hz Operation, CE Certified
| Availability | In Stock |
|---|---|
| Item | 12170-AX |
Specifications:
- 2-Stage Spinning
- Stage 1: 500-2,500 rpm, 2-18 Seconds
- Stage 2: 1,000-8,000 rpm, 3-60 Seconds
- Vacuum: 2.1 CFM
- Speed Stability: <1%
Power:
- 220 VAC, 50 Hz, 1 Amp
Size:
- Depth 10" (25.4 cm)
- Width of 8.5" (21.5 cm)
- Height of 8.5" (21.5 cm)
- Weight: 15 lbs (6.8 kg)
The Model KW-4A spin coater is economically priced, compact and easy to use. The unit is optimized to produce precise and uniform depositions of thin films and coatings. Its rugged, vibration-free and portable design makes it a versatile tool for any high-quality research facility. The basic unit comes with a 7" (178 mm) coating well and a lid to fit the coating well.
Two stage spin process:
This approach allows dispensing at low speeds and homogenizing the coating at high speed. The KW-4A spin coater can be used to deposit metal oxide thin films, polymer coatings, and organic thin films on a wide variety of substrates including SPI Supplies Silicon Nitride Membrane Windows, Multi-Frame Arrays. The higher the spin speed, the thinner the final spun coating.
The largest substrate, theoretically, would be a 9" (229 mm) diagonal measurement. Normally, the largest standard size chuck for the KW-4A is 6" (152 mm). Some space must be allowed between the wall of the bowl and the substrate to avoid splash back, this being the reason for the maximum size is less than the maximum bowl diameter. A second reason has to do with the size of the motor and the need for a larger motor for wafer sizes greater than 6". If one is working with a very thin wafer, then it can be possible to stretch the unit to its limits and coat an 8" wafer. However, one would need a specially fabricated 8" chuck.
Selection of vacuum chucks:
It is important to order the chuck that seems best for your type of work. We generally recommend the next smaller size chuck that is just smaller in size than your largest substrate. It is imperative that there be no exposed chuck surface, otherwise, the coating liquid will be sucked away into the vacuum system, which of course is quite undesirable. If you are working with samples of various sizes, it might be beneficial to have more than one size chuck.
A vacuum chuck is not included with the system. Vacuum chucks are available in aluminum or PTFE.
Accessories and options:
Pumps: The KW-4A Spin Coater needs a small pump to hold the sample in place. We would suggest a diaphragm pump either the 927 or Gast. Both are available in 110V or 220V models.
Liquid Dispenser: Precise dispensing of liquids uniformly onto substrates. Hot Plate: Compact and easy-to-use hotplate for baking and curing thin films and coatings. UV Curer: Specially designed for curing photosensitive coatings and thin films. Environmental Control Chamber: Provides a controllable environment for fabrication of thin films and coatings via spin coating.
